Shanghai shortlist goes on display at V&A

26 Jul 2007

penny.lewis@carnyx.com

The final selection of the winner of the design competition for the £10m British Pavilion for the  Shanghai World Expo 2010 will be announced in September. An exhibition of short listed work has just been launched at the V&A. Scottish practice Draw architects has been working with a team which includes Graven Images, DCMstudios and Arup on developing the design for the exhibition.

Draw architects's team is one of six contenders, which include  Avery Associates Architects with Adams Kara Taylor, Fulcrum and Event Communications, Heatherwick Studio with Adams Kara Taylor, Atelier Ten and Casson Mann, John McAslan + Partners with Arup and Wordsearch, Marks Barfield Architects with Price & Myers, Arup and Imagination, Zaha Hadid.

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